AlGaN/GaN On Si Epi Wafer (AlN Buffer) manufacturer
GaN on Si Epi Wafer
Dimension: 4 inch 6 inch 8 inch
Substrate Thichkness: 675um 1000um
Cap Layer:SiN or GaN cap
Product Description
Purchase next-generation semiconductorwith our AlGaN/GaN on Si epitaxial wafers, engineered with a proprietary AlN buffer layer for unmatched reliability and efficiency. We produce 4inch 6inch and 8inch GaN on Si epi wafers for high-frequency, high-power, and high-temperature applications by MOCVD, these wafers combine cutting-edge materials science with precision manufacturing.
Structure & Design:
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Substrate: We use p-type <111> orientation Si Substrate.
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Buffer Layer: Ultra-thin AlN (Aluminum Nitride) to minimize lattice mismatch and thermal stress.
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Epitaxial Layers: Optimized AlGaN/GaN heterostructure for enhanced 2DEG mobility.
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Cap Layers: SiN cap layer,GaN cap layer or p-GaN cap layer.
Applications:
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RF Amplifiers & 5G Base Stations
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High-Efficiency Power Converters (EVs, Solar Inverters)
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UV Optoelectronics & Sensors
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Military & Aerospace Systems
Why Choose Us?
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MOCVD Expertise: State-of-the-art growth technology for precise layer control.
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Fast Delivery: Short lead times for R&D and volume orders.
Elevate your semiconductor devices with our industry-leading AlGaN/GaN on Si wafers. Request a datasheet or sample today!
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